Bush Clover develops manufacturing technologies with our industry partners in order to provide novel nanoimprinting solutions to our clients.

 

Resist patterns formed via laser or electron beam lithography are too delicate to be used as a mold as they are.

 

We employ a unique low temperature plating process that produces molds at 100nm feature sizes with minimum possible surface deformation.

 

High aspect ratio moth-eye patterns are achieved via the combination of EB lithography and dry etching techniques. Our technology is one of a kind, going as far as supporting adjustable pitch/height ratio.

 

Typical mold processes can only cover areas from 2 to 4 inches. Bush Clover has succeeded in exceeding the typical limit, and together with our industry partners developed a revolutionary technology that supports the creation of molds up to the size of A4 paper.

 

Our mold technologies vary from nanoimprinting, injection moulding, roll-to-roll, nanoimprint etc.