Photolithography is a technology in which a photosensitive resin (photoresist) is applied to the surface of a substrate and patterns of electric circuits and optical elements drawn on a photomask are printed.

 

Unlike electron beam lithography and laser direct writing, it is necessary to make a photomask, but once the mask is prepared, it can be patterned many times at low cost. In addition, it has the advantage of being able to pattern in a short time because it supports batch exposure.

 

We can use Nikon steppers and Suss Microtec contact exposure equipment. The pattern size corresponds to about 1 μm to several hundred μm.