An electron beam is the smallest and most precise fabrication tool available to mankind.

 

We have the tools and experience to fabricate everything from 2D to 3D patterns, including multi level holographic devices, blazed gratings, electrical, optical, biomedical and MEMS.

 

After creating a pattern in resist, it is possible to etch, deposit or electroplate Cu or Ni onto it in order to create a mold for nanoimprinting or injection molding. Our deep knowledge of electron beam technology enables prototyping and manufacturing of never before seen devices.

 

■ Low Cost and Quick Turnaround Fabrication

It is often said that the barriers to entry for electron beam lithography are high. However our connections with top manufacturers allow low cost, quick turnaround fabrication (for example 10 mm² pattern can provided in as little as a week).

 

■ Large Area Patterning

We have made it possible to draw with EB on a large area by combining an EB drawing device that supports high-speed processing such as full exposure to 50 mm square and processing on φ8 inch wafers.

 

■ DOE

Create up to 8 level DOE structures without etching. It is possible to create low loss DOE structures with no 0th order light (Light which passes through the DOE without diffraction). 

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